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VOLUME 74 | ISSUE 6 | PAGE 374 Combined strain and high pressure oxygen treatment effects and phase separation in thin films A. Nossov, P. Strobel+ Institute of Metal Physics, Ural Division RAS, 620219 Ekaterinburg, GSP-170, Russia +Laboratoire de Cristallographie, CNRS, BP 166, 38042 Grenoble, France PACS: 75.50.Pp, 75.70.-i Abstract An evidence for phase separation in high-pressure oxygen treated thin films is presented. This phase separated state is not observed for the x=0.33 classical doping level neither for bulk material, nor for as prepared thin films. It originates from the combined influence of two factors: large strains due to the film-substrate lattice mismatch and high pressure (100 bar) annealing in oxygen. These factors weaken double exchange, drastically enhance low-field magnetoresistance, and lead to hysteresis phenomena. The experimental results are interpreted in terms of phase separation of the film volume into the ferromagnetic conductive matrix with inclusions of spin-glass-like clusters. Download PS file (GZipped, 177.5K)  |  Download PDF file (236K)